Abstrait

XRD, SEM and Low temperature electrical transport in a metallic multilayer

P.J.Sadashivaiah, T.Sujatha, T.Sankarappa


Amultilayer, [Ni(100nm)/Fe(100nm)]3has been investigated for the structure and low temperature resistivity. The resistivity increased with increase in temperature. The residual resistivity ratio (RRR) and the temperature coefficient of resistivity (TCR) were determined. The power law variations of resistivity with temperature were established. The contributions to resistivity for T above 80K are attributed to be predominant by electron-phonon and electron-magnon scatterings and for below 30K they are ascribed to be predominant by electron-electron and electron-defect scattering.


Avertissement: testCe résumé a été traduit à l'aide d'outils d'intelligence artificielle et n'a pas encore été examiné ni vérifié

Indexé dans

  • CASS
  • Google Scholar
  • Ouvrir la porte J
  • Infrastructure nationale du savoir de Chine (CNKI)
  • CiterFactor
  • Cosmos SI
  • Bibliothèque de revues électroniques
  • Répertoire d’indexation des revues de recherche (DRJI)
  • Laboratoires secrets des moteurs de recherche
  • ICMJE

Voir plus

Flyer