Abstrait

Photoreactivity Of Epoxy Resins

Cheng-Siang Lee, Shiliang Fan, Zoubida Seghier, Freddy Y.C.Boey, Marc J.M.Abadie

Work had been done to establish the photoreactivity of epoxy resins with respect to the chemical structure of their monomers. Two epoxymonomers had been choosen, both having two epoxy functional groups at each terminal ends. The difference between these two epoxy monomers being the length separating the two functional groups called the “space” group. Results show that the photochemical reactivity is influenced by the chemical structures of monomers, and thus their physical-chemical properties.